Sputtering targets, serving as materials for thin film deposition, play a crucial role in the semiconductor industry. These targets are utilized in the process of physical vapor deposition (PVD) to deposit thin films onto semiconductor substrates.
Metals, alloys, or oxides or other materials, are deposited onto the substrate of the display screen through the sputtering process, forming thin films to modulate optical and electrical properties.
High-purity metals, alloys, or compound materials are deposited onto the surface of solar panels through the sputtering process to form thin films. Superior sputtering targets enable adjustments in light absorption, electron transfer.
Sputtering targets are widely used in the glass industry. Through the sputtering process, metals, alloys, ITO, or other phase-change materials are deposited onto the surface of glass, creating conductive, reflective.
In semiconductor manufacturing, high-purity metals are used to fabricate transistors and integrated circuits, ensuring efficient electron conduction. In the electronics industry.
The Indium Tin Oxide (ITO) sputtering target is a crucial material used..
The Aluminum-Doped Zinc Oxide (AZO) sputtering target is a highly condu..
The niobium oxide target exhibits excellent chemical stability and elec..
Entering the Torch Antai
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