Sputtering targets, serving as materials for thin film deposition, play a crucial role in the semiconductor industry. These targets are utilized in the process of physical vapor deposition (PVD) to deposit thin films onto semiconductor substrates.
Metals, alloys, or oxides or other materials, are deposited onto the substrate of the display screen through the sputtering process, forming thin films to modulate optical and electrical properties.
High-purity metals, alloys, or compound materials are deposited onto the surface of solar panels through the sputtering process to form thin films. Superior sputtering targets enable adjustments in light absorption, electron transfer.
Sputtering targets are widely used in the glass industry. Through the sputtering process, metals, alloys, ITO, or other phase-change materials are deposited onto the surface of glass, creating conductive, reflective.
In semiconductor manufacturing, high-purity metals are used to fabricate transistors and integrated circuits, ensuring efficient electron conduction. In the electronics industry.
2017Year
60000㎡
43Term
2Billion
Entering the Torch Antai
On product quality. From similar appearance and basic qualification, to standard models and products that are 100% qualified. Shape represents similarity, shape represents model.
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In terms of scale, in terms of efficiency. From praise and appreciation from others, to the company achieving great breakthroughs, building a large domestic target material base, and entering the top three of the worlds target material industry.
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