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  • ITO Sputtering Target
  • ITO Sputtering Target

ITO Sputtering Target

The Indium Tin Oxide (ITO) sputtering target is a crucial material used in the fabrication of optoelectronic and display devices. It possesses excellent transparency and conductivity, allowing for the creation of transparent conductive films and electrodes. Widely applied in LCDs, touchscreens, photodiodes, and solar cells, ITO targets contribute to enhancing the light absorption and electrical energy conversion efficiency of solar panels.

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Product details

Product Name

ITO Sputtering Target

component 

In2O3:SnO290:10±0.5wt),Other proportions according to customer requirements 

appearance 

Black or dark gray 

Purity (%) 

≥ 99.99% 

Relative density (%) 

≥ 99.5% 

Manufacturing specifications (mm) 

Maximum size 1200 * 300 flat target 

Φ 135* Φ 152-162 * L400-1000mm cylindrical target 

Electrical resistivity (m Ω · cm) 

≤1.8×10-4Ω·cm 

Impurities ≤ (ppm) 

Fe 

Al 

Si 

Ni 

Cu 

Pb 

Cr 

Sum 

15 

10 

15 

5 

5 

5 

5 

100