Aluminum target material is a crucial component used in the production of thin films through Physical Vapor Deposition (PVD). It possesses outstanding conductivity and thermal properties, making it extensively utilized in the semiconductor industry, electronic device manufacturing, and optical coatings. It is used to create conductive thin films, metal layers, reflective mirror coatings.
Contact|
Product Name |
Aluminum (Al) Sputtering Target |
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component |
Al |
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appearance |
Silver white, flat or cylindrical |
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Purity (%) |
99.999% |
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Specification (mm) |
Φ125×Φ171×L2342、W1130×L1200×T10、W200×L2650×T12 |
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Impurities ≤ (ppm) |
Fe |
Ti |
Si |
Ni |
Na |
Cu |
Mg |
K |
Mo |
Cr |
Sum |
|
2 |
1 |
2 |
1 |
1 |
2 |
2 |
2 |
1 |
1 |
10 |
|
Consultation hotline
0731-22395998
Consultation hotline
+86 173 9733 1350
